Applications of a complex plasma

The primary goal of this project is to develop novel key concepts employing the grain particles in the most advanced modern technologies such as materials plasma processing and nanotechnology. This project includes This project includes: obtaining insights into the dynamic self-consistent processes of the formation of grain particle as tailored building units with the desired size, composition, and architecture; investigating the physics of processes involved in the self-assembly of ordered nano- and microscale objects in reactive plasmas; elaborating schemes for the controllable deposition of the plasma-grown building units onto patterned substrates targeting fabrication of ordered nano- and microstructures.

Key Publications

S.V. Vladimirov and K. Ostrikov, “Self-Organization and Dynamics of Nanoparticles in Chemically Active Plasmas for Low-Temperature Deposition of Silicon and Carbon-Based Nanostructured Films”, Plasmas and Polymers 8, No. 2 (2003) 135-152.

S.V. Vladimirov and K. Ostrikov, “Dynamic Self-organization Phenomena in Complex Ionized Gas Systems: New Paradigms and Technological Aspects”, Physics Reports 393, No. 3-6 (2004) 175-380.

K. Ostrikov, I.B. Denysenko, S.V. Vladimirov, S. Xu, H. Sugai, and M.Y. Yu, “Low-pressure diffusion equilibrium of electronegative complex plasmas”, Physical Review E 67, No. 5 (2003) 056408.

Z.L. Tsakadze, K. Ostrikov, J.D. Long, and S. Xu, "Self-assembly of uniform carbon nanotip structures in chemically active inductively coupled plasmas", Diamond and Related Materials 13 (2004) 1923-1929.

I.B. Denysenko, K. Ostrikov, P.P. Rutkevich, and S. Xu, "Numerical simulation of nanoparticle- generating electronegative plasmas in the PECVD of nanostructured silicon films", Computational Mater. Sci. 30 (2004) 303-307.

P.P. Rutkevich, K. Ostrikov, S. Xu, and S.V. Vladimirov, “Thermophoretic Control of Building Units in the Plasma-assisted Deposition of Nanostructured Carbon Films”, Journal of Applied Physics 96, No. 8 (2004) 4421-4428.

Figure 1. Films grown in different temperature regimes

Figure 2 A typical micron-sized particle on the substrate

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