Particle Formation in Silane Discharges

Numerical simulations dust particle formation mechanisms in silane discharges made by the team of researchers from Belgium and Netherlands convincingly confirm that the anion SiH[3-] is the most dominant primary precursor of the dust particle formation. In fact, over 90% of the silicon hydride clustering proceeds through the silyl anion (Si[n]H[2n+1]) pathway, starting from SiH[3-].

K.D. Bleecker, A. Bogaerts, R. Gijbels, and W. Goedheer
Numerical investigation of particle formation mechanisms in silane discharges
Phys. Rev. E 69, 056409 (2004)
Abstract Full Text: [ PDF (183kB) GZipped PS Order Online ]

This coincides with the earlier assumption of our group about the dominant role of SiH[3-] anion, used in the modeling of chemically active silane plasmas for the PECVD of nanostructured silicon films.

I. B. Denysenko, K. Ostrikov, S. Xu, M. Y. Yu, and C. H. Diong
Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas
Journal of Applied Physics, 94(9), 6097-6107, (2003)
Abstract Full Text: [ PDF (153kB) GZipped PS Order Online ]

 

Felix Cheung

04/06/2004